Research Article | OPEN ACCESS
Overexpression of D-psicose 3-epimerase from Clostridium cellulolyticum H10 in Bacillus subtilis and its Prospect for D-psicose Production
1Xiaobo Li, 2Yueming Zhu, 2Yan Zeng, 1Tongcun Zhang and 2Yuanxia Sun
1Tianjin University of Science and Technology, Tianjin, 300457, China
2National Engineering Laboratory for Industrial Enzymes, Tianjin Institute of Industrial Biotechnology, CAS, Tianjin, 300308, China
Advance Journal of Food Science and Technology 2013 3:264-269
Received: September 13, 2012 | Accepted: December 17, 2012 | Published: March 15, 2013
Abstract
The aim of this study was to overexpress the D-psicose 3-epimerase from Clostridium cellulolyticum H10 in food-grade microbe. This gene was cloned and expressed in Bacillus subtilis. The results showed that the recombinant protein was soluble, bioactive, and expressed at high levels. The optimum pH and temperature of the enzyme were 8.0 and 50°C, respectively. The activity of the enzyme was not dependent on metal ions; however, some metal ions, such as $Co^{2+}$, can make the enzyme more thermostable. The Michaelis-Menten constant (Km) of the enzyme for D-psicose was much lower than that for D-tagatose, suggesting that the optimum substrate of the enzyme is D-psicose. D-Psicose 3-epimerase expressed in the food-grade B. subtilis may be used for the industrial production of D-psicose.
Keywords:
3-epimerase, Bacillus subtilis , Clostridium cellulolyticum , D-psicose, D-psicose food-grade,
Competing interests
The authors have no competing interests.
Open Access Policy
This article is distributed under the terms of the Creative Commons Attribution 4.0 International License (http://creativecommons.org/licenses/by/4.0/), which permits unrestricted use, distribution, and reproduction in any medium, provided you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made.
Copyright
The authors have no competing interests.
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ISSN (Online): 2042-4876
ISSN (Print): 2042-4868 |
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