Research Article | OPEN ACCESS
An Investigation of the Relationship between Resistance and Thickness of Deposited Nickel Thin Film Resistors
1Ericam R.R. Mucunguzi-Rugwebe and 2Michael Josiah Mangala
1Kyambogo University, Kyambogo, Uganda
2University of Nairobi, Nairobi, Kenya
Research Journal of Applied Sciences, Engineering and Technology 2013 21:3922-3926
Received: November 08, 2012 | Accepted: February 18, 2013 | Published: November 20, 2013
Abstract
The main purpose of this study is finding the relationship between resistance and thickness of deposited Nickel Thin Film Resistors. It was found that the Sheet Resistance, Rs, is inversely proportional to the thickness of the film on the substrate. It was also observed that when the film thickness is greater than 50 nm, films behave like ordinary resistors. In other words in bulk, films obey Ohm’s law if other physical quantities remain constant.
Keywords:
Energy dispersive, thin film resistors, X-ray fluorescence analysis,
Competing interests
The authors have no competing interests.
Open Access Policy
This article is distributed under the terms of the Creative Commons Attribution 4.0 International License (http://creativecommons.org/licenses/by/4.0/), which permits unrestricted use, distribution, and reproduction in any medium, provided you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made.
Copyright
The authors have no competing interests.
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ISSN (Online): 2040-7467
ISSN (Print): 2040-7459 |
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