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     Research Journal of Applied Sciences, Engineering and Technology


Influence of Post-deposition Heat Treatments on the Optical Properties of Chemically Deposited Nanocrystalline TiO2 Thin Films

1, 2D.U. Onah, 1P.A. Nwofe and 1H.E. Uguru
1Department of Industrial Physics, Ebonyi State University, Abakaliki
2Department of Physics and Astronomy, University of Nigeria, Nsukka, Nigeria
Research Journal of Applied Sciences, Engineering and Technology  2016  3:253-256
http://dx.doi.org/10.19026/rjaset.13.2938  |  © The Author(s) 2016
Received: February ‎13, ‎2016  |  Accepted: May ‎5, ‎2016  |  Published: August 05, 2016

Abstract

The aim of this study is to investigate the potentials of TiO2 thin films for device applications. Nanocrystalline single phase of rutile TiO2 thin films have been prepared by Chemical Bath Deposition (CBD) technique at bath temperature range from 75-80C, keeping other deposition variables constant. The films were then subjected to post-deposition heat treatments with annealing temperatures in the range 373 to 673 K. The optical characterisation was done using the Elmer Lambda-2 spectrometer to investigate the transmittance and absorbance versus wavelength measurements. The data obtained from the transmittance and absorbance measurements were used to deduce the important optical constants. The results show that the energy bandgap was direct, with values in the range ≤1.8 eV for the as-deposited layers and ≥2.2 eV for the annealed layers. At lower temperatures, the band gaps of the annealed samples did not differ significantly from the energy gap (1.8 eV) of the as-deposited film. At higher thermal treatment, the energy gaps increased with the increase in annealing temperatures and a maximum of 2.2 eV for the energy gap was determined for TiO2 film annealed at 673 K. The values of the energy bandgap obtained in study, are within the range suitable for application in photovoltaic solar cell devices and in related photonic applications.

Keywords:

Energy band gap, solar cells, TiO2, thermal annealing,


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Competing interests

The authors have no competing interests.

Open Access Policy

This article is distributed under the terms of the Creative Commons Attribution 4.0 International License (http://creativecommons.org/licenses/by/4.0/), which permits unrestricted use, distribution, and reproduction in any medium, provided you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made.

Copyright

The authors have no competing interests.

ISSN (Online):  2040-7467
ISSN (Print):   2040-7459
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